Science Fair Project Encyclopedia
Physical vapor deposition
Physical vapor deposition (PVD) is a technique in semiconductor device fabrication used to deposit thin films of various materials onto various surfaces (e.g., of semiconductor wafers) by physical means, as compared to chemical vapor deposition.
Variants of PVD include
- Evaporative deposition
- Sputtering
- Pulsed laser deposition
10-26-2009 08:16:03
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The contents of this article is licensed from www.wikipedia.org under the GNU Free Documentation License. Click here to see the transparent copy and copyright details


